ANNEAL PROCESSING METHOD OF SHADOW MASK

• Main Authors: IHARA SHINYA, KUNO HISASHI, SOGA TOMOAKI
• Format: Patent
• Language: English
• Published: 09.05.2003
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY

PROBLEM TO BE SOLVED: To provide an anneal processing method of a shadow mask, which uses a high-strength material as the material of the shadow mask, and even if the anneal processing is carried out in a continuation furnace performs in a state where the shadow masks have been piled with, uneven di...