ANNEAL PROCESSING METHOD OF SHADOW MASK

PROBLEM TO BE SOLVED: To provide an anneal processing method of a shadow mask, which uses a high-strength material as the material of the shadow mask, and even if the anneal processing is carried out in a continuation furnace performs in a state where the shadow masks have been piled with, uneven di...

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Bibliographic Details
Main Authors IHARA SHINYA, KUNO HISASHI, SOGA TOMOAKI
Format Patent
LanguageEnglish
Published 09.05.2003
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:PROBLEM TO BE SOLVED: To provide an anneal processing method of a shadow mask, which uses a high-strength material as the material of the shadow mask, and even if the anneal processing is carried out in a continuation furnace performs in a state where the shadow masks have been piled with, uneven discoloration can not be generated on the surface of the skirt part of the shadow mask, and also, uneven black color can not be generated in a blacking processing. SOLUTION: When the anneal processing is carried out with piling up the shadow masks, the anneal processing is carried out after making the circumference edge of the skirt part of the shadow mask 21 have waves so that reduction gas may fully flow in between the skirt parts 23 of the piled shadow masks.
Bibliography:Application Number: JP20010327730