METHOD FOR PATTERNWISE EXPOSURE

• Main Authors: SUZUKI HARUHIRO, WATANABE TADASHI
• Format: Patent
• Language: English
• Published: 05.03.2003
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CINEMATOGRAPHY; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PRINTED CIRCUITS

PROBLEM TO BE SOLVED: To provide a patternwise exposure method in which foreign matter of a prescribed size or below sticking to a mask for exposure, etc., is not transferred as a defect pattern when a photosensitive layer formed on a substrate to be treated is patternwise exposed using a light source for exposure and the mask for exposure. SOLUTION: When a photosensitive layer formed on a substrate to be treated is patternwise exposed with an exposure device using collimated light as light for exposure, a film or a platelike material 20 for diffusing light is interposed between a light source 10 for exposure and a mask (practical plate) 30 for exposure to convert light for exposure radiated on the mask 30 to pseudo- scattered light. Though pattern resolution is somewhat sacrificed, the transfer of a pattern of foreign matter of a prescribed size or below sticking to the mask 30 for exposure, etc., is prevented.