METHOD FOR PATTERNWISE EXPOSURE

PROBLEM TO BE SOLVED: To provide a patternwise exposure method in which foreign matter of a prescribed size or below sticking to a mask for exposure, etc., is not transferred as a defect pattern when a photosensitive layer formed on a substrate to be treated is patternwise exposed using a light sour...

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Bibliographic Details
Main Authors SUZUKI HARUHIRO, WATANABE TADASHI
Format Patent
LanguageEnglish
Published 05.03.2003
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS
CINEMATOGRAPHY
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PRINTED CIRCUITS
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Summary:PROBLEM TO BE SOLVED: To provide a patternwise exposure method in which foreign matter of a prescribed size or below sticking to a mask for exposure, etc., is not transferred as a defect pattern when a photosensitive layer formed on a substrate to be treated is patternwise exposed using a light source for exposure and the mask for exposure. SOLUTION: When a photosensitive layer formed on a substrate to be treated is patternwise exposed with an exposure device using collimated light as light for exposure, a film or a platelike material 20 for diffusing light is interposed between a light source 10 for exposure and a mask (practical plate) 30 for exposure to convert light for exposure radiated on the mask 30 to pseudo- scattered light. Though pattern resolution is somewhat sacrificed, the transfer of a pattern of foreign matter of a prescribed size or below sticking to the mask 30 for exposure, etc., is prevented.
Bibliography:Application Number: JP20010261310