NEGATIVE TYPE RESIST COMPOSITION

PROBLEM TO BE SOLVED: To provide a negative type resist composition that simultaneously satisfies such characteristics as sensitivity, resolution, pattern shape and line edge roughness when KrF excimer laser light, electron beams or X-rays is used. SOLUTION: The negative type resist composition cont...

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Bibliographic Details
Main Authors TAKAHASHI AKIRA, YASUNAMI SHOICHIRO
Format Patent
LanguageEnglish
Published 18.12.2002
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide a negative type resist composition that simultaneously satisfies such characteristics as sensitivity, resolution, pattern shape and line edge roughness when KrF excimer laser light, electron beams or X-rays is used. SOLUTION: The negative type resist composition contains (A) a compound which generates an acid when irradiated with active light or radiation, (B) an alkali-soluble polymer, (C) a crosslinker which causes crosslinking with the polymer (B) under the action of the acid and (D) a specified ammonium inner salt type compound.
Bibliography:Application Number: JP20010174294