POSITIVE TYPE IMAGE FORMING MATERIAL AND POSITIVE IMAGE FORMING METHOD USING THE SAME
PROBLEM TO BE SOLVED: To provide a positive type image forming material having high sensitivity to light in the near infrared region, excellent in contrast between image and non-image areas, ensuring a wide range of development conditions and excellent also in chemical resistance as a positive type...
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Main Author | |
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Format | Patent |
Language | English |
Published |
22.11.2002
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a positive type image forming material having high sensitivity to light in the near infrared region, excellent in contrast between image and non-image areas, ensuring a wide range of development conditions and excellent also in chemical resistance as a positive type image forming material obtained by forming a layer of a positive type photosensitive composition comprising a photothermal conversion material and an alkali-soluble resin on the surface of a support and to provide a positive image forming method using the material. SOLUTION: The positive type image forming material is obtained by forming a layer of a positive type photosensitive composition comprising a photothermal conversion material which absorbs light of a light source for imagewise exposure and converts it into heat and an alkali-soluble resin on the surface of a support, and the alkali- soluble resin is a phenolic resin in which o-cresol occupies 25-40 mol% of phenol components constituting molecules whose molecular weight is <=2,000 and o-cresol occupies <=25 mol% of phenol components constituting molecules whose molecular weight is >=10,000. In the positive image forming method, the positive type image forming material is subjected to scanning exposure with laser light in the wavelength range of 650-1,300 nm and developed with an alkali developing solution. |
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Bibliography: | Application Number: JP20010136912 |