ELECTRON BEAM ANALYZER

PROBLEM TO BE SOLVED: To achieve a three-dimensional analysis on bulk samples. SOLUTION: Inside an analysis chamber 3, an electron beam irradiation part 4 is provided to generate electron beams B made to irradiate a sample S, an X-ray spectral detector 5 which spectrally detects X rays R generated f...

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Bibliographic Details
Main Authors MITAMURA SHIGEHIRO, HAYASHI KOJI
Format Patent
LanguageEnglish
Published 23.10.2002
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Summary:PROBLEM TO BE SOLVED: To achieve a three-dimensional analysis on bulk samples. SOLUTION: Inside an analysis chamber 3, an electron beam irradiation part 4 is provided to generate electron beams B made to irradiate a sample S, an X-ray spectral detector 5 which spectrally detects X rays R generated from the sample, an electron detector 6 which detects electrons E generated from the sample and the like. A glow discharging part 8 is arranged near an analyzing position P1 where the sample is irradiated with the electron beams--as an etching position P2. A sample stage 7 is provided to move the sample S between the two positions. After the etching of the surface of the sample at the P2, analysis on the surface of the sample is repeated at the P1, thereby achieving a three-dimensional analysis for obtaining the three-dimensional information distribution of the sample.
Bibliography:Application Number: JP20010117011