PHOTOSENSITIVE COMPOSITION

PROBLEM TO BE SOLVED: To provide a photosensitive composition containing a photo-initiating system with high sensitivity for visible light and excellent stability and more particularly, to provide a photopolymerizable composition excellent as a material for a planographic printing original plate whi...

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Bibliographic Details
Main Authors YANAGI TERUKAZU, OKADA HISASHI, SORORI TADAHIRO, ARAI KAZUMI
Format Patent
LanguageEnglish
Published 11.09.2002
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:PROBLEM TO BE SOLVED: To provide a photosensitive composition containing a photo-initiating system with high sensitivity for visible light and excellent stability and more particularly, to provide a photopolymerizable composition excellent as a material for a planographic printing original plate which enables plate making by scanning exposure based on digital signals. SOLUTION: The photosensitive composition contains (i) a sensitizing dye expressed by a specified formula, (ii) an activating agent compound which causes chemical reaction by the interaction with the excited state of electrons produced by the absorption of light of the sensitizing dye to produce at least one kind of radicals, acids and bases, and (iii) a compound which reacts with at least one kind of radicals, acids, bases to change its physical or chemical characteristics and to keep the changed state.
Bibliography:Application Number: JP20010056424