FLUORINE-CONTAINING COMPOUND

PROBLEM TO BE SOLVED: To provide a fluorine-containing monomer which can form resins and thin films having excellent scratch resistance and durability. SOLUTION: The compound of the general formula 1 [(n) is 1 to 10]. The method for producing the compound of the general formula 1 comprises esterifyi...

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Main Authors OTSUKA TATSUYA, KARUBE DAISUKE
Format Patent
LanguageEnglish
Published 14.08.2002
Edition7
Subjects
ACYCLIC OR CARBOCYCLIC COMPOUNDS
CHEMISTRY
METALLURGY
ORGANIC CHEMISTRY
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Abstract PROBLEM TO BE SOLVED: To provide a fluorine-containing monomer which can form resins and thin films having excellent scratch resistance and durability. SOLUTION: The compound of the general formula 1 [(n) is 1 to 10]. The method for producing the compound of the general formula 1 comprises esterifying an α-fluoroacrylic halide with a tetraol in the presence of a dehalogenating agent and a metal halide.
AbstractList PROBLEM TO BE SOLVED: To provide a fluorine-containing monomer which can form resins and thin films having excellent scratch resistance and durability. SOLUTION: The compound of the general formula 1 [(n) is 1 to 10]. The method for producing the compound of the general formula 1 comprises esterifying an α-fluoroacrylic halide with a tetraol in the presence of a dehalogenating agent and a metal halide.
Author OTSUKA TATSUYA
KARUBE DAISUKE
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Snippet PROBLEM TO BE SOLVED: To provide a fluorine-containing monomer which can form resins and thin films having excellent scratch resistance and durability....
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CHEMISTRY
METALLURGY
ORGANIC CHEMISTRY
Title FLUORINE-CONTAINING COMPOUND
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