FLUORINE-CONTAINING COMPOUND

PROBLEM TO BE SOLVED: To provide a fluorine-containing monomer which can form resins and thin films having excellent scratch resistance and durability. SOLUTION: The compound of the general formula 1 [(n) is 1 to 10]. The method for producing the compound of the general formula 1 comprises esterifyi...

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Bibliographic Details
Main Authors OTSUKA TATSUYA, KARUBE DAISUKE
Format Patent
LanguageEnglish
Published 14.08.2002
Edition7
Subjects
ACYCLIC OR CARBOCYCLIC COMPOUNDS
CHEMISTRY
METALLURGY
ORGANIC CHEMISTRY
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Summary:PROBLEM TO BE SOLVED: To provide a fluorine-containing monomer which can form resins and thin films having excellent scratch resistance and durability. SOLUTION: The compound of the general formula 1 [(n) is 1 to 10]. The method for producing the compound of the general formula 1 comprises esterifying an α-fluoroacrylic halide with a tetraol in the presence of a dehalogenating agent and a metal halide.
Bibliography:Application Number: JP20010030830