METHOD AND APPARATUS FOR MAKING QUARTZ GLASS BODY

PROBLEM TO BE SOLVED: To provide a method of making a quartz glass body having material characteristics as uniform as possible. SOLUTION: In the known method of making the quartz glass body, a silicon- containing starting compound is supplied to a burner (7) for deposition and SiO2 particles are for...

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Bibliographic Details
Main Authors SCHAEFER JUERGEN, TROMMER MARTIN, BAUSCHER HEINZ, ENGLISCH WOLFGANG
Format Patent
LanguageEnglish
Published 31.07.2002
Edition7
Subjects
CHEMISTRY
GLASS
MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
METALLURGY
MINERAL OR SLAG WOOL
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Summary:PROBLEM TO BE SOLVED: To provide a method of making a quartz glass body having material characteristics as uniform as possible. SOLUTION: In the known method of making the quartz glass body, a silicon- containing starting compound is supplied to a burner (7) for deposition and SiO2 particles are formed from this compound in a burner flame (6). The particles are deposited on a deposition surface (9) of a cap shape of a carrier (2) rotating around a central shaft (3) and are vitrified during the formation of the quartz glass body (8). The distance between the burner (7) for deposition and the deposition surface is controlled. The making of the quartz glass having the material characteristics as uniform as possible in compliance with a VAD process is made possible by means of maintaining the geometrical shape of the deposition surface during the deposition by this method. The apparatus for making the quartz glass body in such a manner that its reformation is possible is provided with means (11; 12; 17; 19; 37; 38) in order to maintain the geometrical shape.
Bibliography:Application Number: JP20010359800