APPARATUS AND METHOD FOR CLEANING SUBSTRATE TO BE TREATED

PROBLEM TO BE SOLVED: To provide an apparatus and a method for cleaning a substrate to be treated, which is excellent in energy saving effect and in which the throughput of the substrate to be treated can be increased. SOLUTION: The saving of energy and the increase of the throughput are achieved by...

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Bibliographic Details
Main Author MORITA KOICHI
Format Patent
LanguageEnglish
Published 30.07.2002
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
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Summary:PROBLEM TO BE SOLVED: To provide an apparatus and a method for cleaning a substrate to be treated, which is excellent in energy saving effect and in which the throughput of the substrate to be treated can be increased. SOLUTION: The saving of energy and the increase of the throughput are achieved by preheating a cleaning liquid (a) before supplied to a treating tank 2 by using a waste cleaning liquid 4 or the cleaning liquid during treatment as a preheating source.
Bibliography:Application Number: JP20010008247