TREATMENT EQUIPMENT FOR WASTE AMMONIUM ION MEASURE LIQUID AND AMMONIUM ION MEASURING INSTRUMENT HAVING THE SAME

PROBLEM TO BE SOLVED: To enable direct discharge of a waste ammonium ion measuring liquid to a public sewerage system. SOLUTION: The treatment equipment for the waste ammonium ion concentration measuring liquid discharged from an ammonium ion concentration measuring instrument which measures the amm...

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Bibliographic Details
Main Authors YOTSUMOTO HIROSHI, KUSUMI MIYOKO, WATANABE TETSUFUMI
Format Patent
LanguageEnglish
Published 25.06.2002
Edition7
Subjects
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Summary:PROBLEM TO BE SOLVED: To enable direct discharge of a waste ammonium ion measuring liquid to a public sewerage system. SOLUTION: The treatment equipment for the waste ammonium ion concentration measuring liquid discharged from an ammonium ion concentration measuring instrument which measures the ammonia nitrogen concentration in sample water by injecting and mixing a reaction reagent into sample water containing an ammonium ion concentration while allowing the sample water to flow down in a capillary for a flow passage and converting the gaseous component separated from a liquid phase by a gas-liquid separator 60b to nitrogen monoxide by thermal oxidation, then supplying the same to a chemical emitted light detector 85 and detecting the intensity of the chemical emitted light is equipped with a waste liquid vessel 1 to which the waste measuring liquid discharged from the gas-liquid separator 60b is supplied, a pH meter for measuring the pH of the liquid phase in the waste liquid vessel 1 and a valve means (flow rate regulating valve V1) for supplying the sample water as the diluting liquid of the liquid phase in the waste liquid vessel 1. A residual chlorine concentration meter for measuring the residual chlorine concentration of the liquid phase in the waste liquid vessel 1 is annexed in some cases to the waste liquid vessel 1. The measured residual chlorine concentration is a control factor of the valve means described above.
Bibliography:Application Number: JP20000379684