METHOD OF MANUFACTURING FIRST ELECTRODE AND SECOND ELECTRODE, ELECTRONIC COMPONENT AND ELECTRONIC MEMORY DEVICE

• Main Author: SARSTEDT MARGIT
• Format: Patent
• Language: English
• Published: 31.05.2002
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a method of manufacturing a first electrode and a second electrode which allows the correct control of the grain size in an insular section formed on the surfaces of the electrodes. SOLUTION: The first electrode and the second electrode which are formed of an electrode material are prepared. Using a source of cluster ions, clusters formed of the electrode material are supplied onto the first electrode and/or the second electrode.