STENCIL MASK AND ITS MANUFACTURING METHOD
PROBLEM TO BE SOLVED: To obtain a mask, in which an isolated pattern is surrounded by an opening pattern in a stencil mask. SOLUTION: A method for manufacturing the stencil mark comprises the steps of selectively retaining an insulating film part of an SOI wafer of a material of the mask, to incorpo...
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Main Author | |
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Format | Patent |
Language | English |
Published |
15.02.2002
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To obtain a mask, in which an isolated pattern is surrounded by an opening pattern in a stencil mask. SOLUTION: A method for manufacturing the stencil mark comprises the steps of selectively retaining an insulating film part of an SOI wafer of a material of the mask, to incorporate a role of a beam for holding a shielding pattern surrounded in the opening pattern, and forming a pattern on the stencil mask such that a shape of the pattern is floating in the air. |
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Bibliography: | Application Number: JP20000236092 |