HIGHLY DURABLE COATING FILM STRUCTURE

PROBLEM TO BE SOLVED: To provide a new highly durable coating film structure capable of effectively suppressing a photodegradation or the like for a long period and providing excellent durability at a relatively low cost. SOLUTION: The highly durable coating film structure comprises an organic coati...

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Bibliographic Details
Main Author FUKIAGE MASAHIRO
Format Patent
LanguageEnglish
Published 05.02.2002
Edition7
Subjects
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Summary:PROBLEM TO BE SOLVED: To provide a new highly durable coating film structure capable of effectively suppressing a photodegradation or the like for a long period and providing excellent durability at a relatively low cost. SOLUTION: The highly durable coating film structure comprises an organic coating film executed on a base and a finishing coating film executed on an uppermost layer so that the uppermost finishing coating film is formed as a transparent silicone resin film containing an inorganic ultraviolet absorber.
Bibliography:Application Number: JP20000220552