ACRYLATE COMPOUND AND METHOD OF PRODUCING THE SAME

PROBLEM TO BE SOLVED: To provide an alicyclic acrylate compound used as a monomer for a photoresist which has high transparency to the far ultraviolet rays having a wave length of <=248 μm, is excellent in dry-etching resistance, exhibits good adhesion to a substrate and good solubility in an alk...

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Bibliographic Details
Main Authors TAKIGAWA SHINICHIRO, SUZUKI HIDEO
Format Patent
LanguageEnglish
Published 27.11.2001
Edition7
Subjects
ACYCLIC OR CARBOCYCLIC COMPOUNDS
APPARATUS THEREFOR
CHEMISTRY
GENERAL METHODS OF ORGANIC CHEMISTRY
HETEROCYCLIC COMPOUNDS
METALLURGY
ORGANIC CHEMISTRY
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Summary:PROBLEM TO BE SOLVED: To provide an alicyclic acrylate compound used as a monomer for a photoresist which has high transparency to the far ultraviolet rays having a wave length of <=248 μm, is excellent in dry-etching resistance, exhibits good adhesion to a substrate and good solubility in an alkaline developing solution, and further has high sensitivity and high resolving power. SOLUTION: This alicyclic acrylate compound has one of tricyclo [5.2.1.02,6] decane skeletal structures expressed by the formulae [1] to [4] (R1 is H or a 1-4C alkyl; and R2, R3, R4 and R5 are each H or a 1-10C alkyl).
Bibliography:Application Number: JP20000147397