SOLID-STATE IMAGE SENSING ELEMENT AND ITS MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a solid-state image sensing element in which sensitivity and stability are improved by preventing 'vignetting' of a condensed light which is to be caused by an anti-reflection pattern, and a manufacturing method of the element. SOLUTION: This solid-state im...

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Bibliographic Details
Main Author NATORI TAICHI
Format Patent
LanguageEnglish
Published 16.11.2001
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC COMMUNICATION TECHNIQUE
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PICTORIAL COMMUNICATION, e.g. TELEVISION
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide a solid-state image sensing element in which sensitivity and stability are improved by preventing 'vignetting' of a condensed light which is to be caused by an anti-reflection pattern, and a manufacturing method of the element. SOLUTION: This solid-state image sensing element is provided with the anti-reflection pattern 31 having an aperture 31 a on a photo sensor 11 between a light shielding film 16 opening a part above the photo sensor 11 on a substrate 10 surface and a microlens 18 for condensing a light in a light receiving part 11. An inner wall upper part of the aperture part 31 a of the anti-reflection pattern 31 is molded in an R-shaped tapered form. Consequently, a condensed light (h) condensed by the microlens 18 can be prevented from being 'shaded' by an aperture upper part of the pattern 31, without increasing an aperture diameter of the aperture part 31a on the photo sensor 11 side.
Bibliography:Application Number: JP20000135418