LIQUID DISPERSION SUPPLYING UNIT AND VACUUM LIQUID TREATING DEVICE

• Main Author: NISHIMI HARUYUKI
• Format: Patent
• Language: English
• Published: 28.08.2001
• Edition: 7
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; ATOMISING APPARATUS; CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY; CHEMISTRY; COMPOSITIONS BASED THEREON; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; METALLURGY; NOZZLES; ORGANIC MACROMOLECULAR COMPOUNDS; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; SPRAYING APPARATUS; SPRAYING OR ATOMISING IN GENERAL; THEIR PREPARATION OR CHEMICAL WORKING-UP; THEIR RELEVANT APPARATUS; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a liquid dispersion supplying unit which allows upsizing of the subject device without increasing the mechanical strength and rigidity of the respective sections of the device and without receiving the restrictions of thermal shrinkage, thermal expansion, or the like, is capable of making the flow rate of flowing down fluid uniform by dispersing the fluid in a vessel and is easily and rapidly dealable with the changes in the specifications of throughput, and the vacuum fluid treating device. SOLUTION: This device has the vacuum vessel which has a fluid take-out port at its bottom and is formed with a liquid introducing port connected to an external fluid supplying source via a piping in its upper part, the liquid dispersion supplying units which are arrayed near the upper part of this vacuum vessel and an internal piping which connects the fluid introducing port of the vessel and the fluid intake ports of the liquid dispersion supplying units within the vessel. The liquid dispersion supplying units are composed of fluid chambers which are formed with the fluid intake ports in their upper parts and are closed at their bottoms with perforated plates having many pores communicating with the inside and outside of the chambers.