TEXTURING METHOD AND DEVICE

PROBLEM TO BE SOLVED: To provide a texturing method and a device which can be installed in a clean room together with preceding and following process equipment with very little occurrence of the soil, and whose processing efficiency is high com pared with loose abrasive grain, and can perform the st...

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Bibliographic Details
Main Authors OMORI HITOSHI, ITO NOBUHIDE, MORIYA NORIO, HAYASHI IMIN
Format Patent
LanguageEnglish
Published 03.08.2001
Edition7
Subjects
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Summary:PROBLEM TO BE SOLVED: To provide a texturing method and a device which can be installed in a clean room together with preceding and following process equipment with very little occurrence of the soil, and whose processing efficiency is high com pared with loose abrasive grain, and can perform the stable texturing processing. SOLUTION: The texturing is applied to a substrate surface by forcing the cylindrical surface of a tool on the substrate surface, and making the tool and the substrate move relatively along the substrate surface, rotationally driving a disk-like substrate 1 centering on the axial center, and rotationally driving the cylinder-like tool 12 centering on the axial center parallel to the substrate surface, and cleaning the cylindrical surface of the tool and the substrate surface. The cylinder-like tool 12 is used as an anode through a power feeding body 14, uses as a cathode the circular electrode 16 opposed to the cylindrical surface of the cylinder-like tool, supplies conductive working liquid 7 between the cylinder-like tool and the circular electrode, applies the electrolysis dressing, and cleans the cylindrical surface of the tool.
Bibliography:Application Number: JP20000016622