METHOD AND APPARATUS FOR INSPECTION OF IRREGULARITY IN PERIODIC PATTERN

PROBLEM TO BE SOLVED: To enhance the inspection accuracy of irregularities in a periodic pattern by detecting a fine luminance irregularity which cannot be inspected, when an inspection image which is imaged is blurred. SOLUTION: In the inspection apparatus for irregularities in the periodic pattern...

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Bibliographic Details
Main Authors OKAZAWA ATSUSHI, CHINJU TAKUTETSU, NISHIDA MASASHI, SOEDA MASAHIKO
Format Patent
LanguageEnglish
Published 27.07.2001
Edition7
Subjects
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Summary:PROBLEM TO BE SOLVED: To enhance the inspection accuracy of irregularities in a periodic pattern by detecting a fine luminance irregularity which cannot be inspected, when an inspection image which is imaged is blurred. SOLUTION: In the inspection apparatus for irregularities in the periodic pattern, the lack of uniformity of the periodic pattern is inspected on the basis of the inspection image which is obtained, in such a way that a sample W having the periodic pattern is imaged by an imaging device 18. A rotating mechanism 24, which turns the imaging device 18 is installed in order to change an angle which is formed by a first coordinate axis which substantially prescribes the forming face of the periodic pattern on the sample W and by a second coordinate axis, which prescribes the imaging face provided at the imaging device 18.
Bibliography:Application Number: JP20000011382