PLASMA TREATMENT DEVICE
PROBLEM TO BE SOLVED: To make a polymer film, sticking to the surface of a member provided near a lower electrode or an inner wall surface of a reaction chamber, hard to peel off. SOLUTION: A susceptor 11 is provided to the bottom of a reaction chamber 10, and a vacuum bellows 12 is placed around th...
Saved in:
Main Authors | , , |
---|---|
Format | Patent |
Language | English |
Published |
19.07.2001
|
Edition | 7 |
Subjects | |
Online Access | Get full text |
Cover
Loading…
Abstract | PROBLEM TO BE SOLVED: To make a polymer film, sticking to the surface of a member provided near a lower electrode or an inner wall surface of a reaction chamber, hard to peel off. SOLUTION: A susceptor 11 is provided to the bottom of a reaction chamber 10, and a vacuum bellows 12 is placed around the susceptor 11. A holder 13 is provided on the vacuum bellows 12, and further a lower electrode 14 is provided on the susceptor 11. A silicon ring 17 is provided around a semiconductor substrate 16 on the lower electrode 14, and a focus ring 18 is provided outside of the silicon ring 17. The part of the holder 13 not covered with the focus ring 18 and the upper surface, and the upper part of the side surface of the vacuum bellows 12, are covered with a cover member 51 comprising a polyether resin. |
---|---|
AbstractList | PROBLEM TO BE SOLVED: To make a polymer film, sticking to the surface of a member provided near a lower electrode or an inner wall surface of a reaction chamber, hard to peel off. SOLUTION: A susceptor 11 is provided to the bottom of a reaction chamber 10, and a vacuum bellows 12 is placed around the susceptor 11. A holder 13 is provided on the vacuum bellows 12, and further a lower electrode 14 is provided on the susceptor 11. A silicon ring 17 is provided around a semiconductor substrate 16 on the lower electrode 14, and a focus ring 18 is provided outside of the silicon ring 17. The part of the holder 13 not covered with the focus ring 18 and the upper surface, and the upper part of the side surface of the vacuum bellows 12, are covered with a cover member 51 comprising a polyether resin. |
Author | IMAI SHINICHI SEKI KAZUNORI JIWARI NOBUHIRO |
Author_xml | – fullname: IMAI SHINICHI – fullname: SEKI KAZUNORI – fullname: JIWARI NOBUHIRO |
BookMark | eNrjYmDJy89L5WQQD_BxDPZ1VAgJcnUM8XX1C1FwcQ3zdHblYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBgaGhpZmxqbmjsZEKQIA3Zshlg |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences |
Edition | 7 |
ExternalDocumentID | JP2001196357A |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_JP2001196357A3 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 12:17:11 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_JP2001196357A3 |
Notes | Application Number: JP20000006044 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20010719&DB=EPODOC&CC=JP&NR=2001196357A |
ParticipantIDs | epo_espacenet_JP2001196357A |
PublicationCentury | 2000 |
PublicationDate | 20010719 |
PublicationDateYYYYMMDD | 2001-07-19 |
PublicationDate_xml | – month: 07 year: 2001 text: 20010719 day: 19 |
PublicationDecade | 2000 |
PublicationYear | 2001 |
RelatedCompanies | MATSUSHITA ELECTRIC IND CO LTD |
RelatedCompanies_xml | – name: MATSUSHITA ELECTRIC IND CO LTD |
Score | 2.5362484 |
Snippet | PROBLEM TO BE SOLVED: To make a polymer film, sticking to the surface of a member provided near a lower electrode or an inner wall surface of a reaction... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
Title | PLASMA TREATMENT DEVICE |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20010719&DB=EPODOC&locale=&CC=JP&NR=2001196357A |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwY2BQSU5NMjUwTAEm3lSzVF2T5KRU3SRLY0tds-REQ3NjU4sUS1PQ3mFfPzOPUBOvCNMIJoZs2F4Y8Dmh5eDDEYE5KhmY30vA5XUBYhDLBby2slg_KRMolG_vFmLrogbrHQM7M8Ac6OJk6xrg7-LvrObsbOsVoOYXBJYDJTZTc0dmBlZgO9oclB1cw5xA21IKkOsUN0EGtgCgcXklQgxMqXnCDJzOsKvXhBk4fKEz3kAmNPMVizCIB_g4Bvs6KoQEuTqGgM7gV3BxDfN0dhVlUHJzDXH20AXaEA_3T7xXAJJrjMUYWIAd_VQJBoUki0QTw5RkI2CWSjRJTjNKAta-SWaGyaYpiYnAVliSJIM0HoOk8MpKM3BBVk-Z6xpayjCwlBSVpsoCq9OSJDlwMAAAZPZ1uA |
link.rule.ids | 230,309,783,888,25576,76876 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LT4NAEJ7Uaqw3rVq1Pogx3IhSWCgHYiiPUARKKja9EXZZE2NSG4vx7ztg0Z562-wks4_MtzOzOzMLcMc4JQ9ygcLLNS6pjHKJGoohaSyXdYUMC4NUucNRrPkvajAn8xa8N7kwdZ3Q77o4IiKKId7L-rxe_l9iOXVs5eqevmHXx6OXmo7YeMfozCACnZHpJhNnYou2bQaJGE9rWiVsRLd2YBdtbL2CgzsbVWkpy02d4h3CXoLsFuURtPiiCx27-XqtC_vR-sUbm2vwrY6hl4TWc2QJ6dS10qoGv-C4s7HtnsCt56a2L-EI2d96siDZmI1yCm109PkZCHSYq3LBBgipXGWvA4ral2oyI0WeoxVGz6G_hdHFVuoNdPw0CrNwHD_14eA3kkqXZOMS2uXnF79C1VrS63pLfgAUjXir |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=PLASMA+TREATMENT+DEVICE&rft.inventor=IMAI+SHINICHI&rft.inventor=SEKI+KAZUNORI&rft.inventor=JIWARI+NOBUHIRO&rft.date=2001-07-19&rft.externalDBID=A&rft.externalDocID=JP2001196357A |