PLASMA TREATMENT DEVICE

PROBLEM TO BE SOLVED: To make a polymer film, sticking to the surface of a member provided near a lower electrode or an inner wall surface of a reaction chamber, hard to peel off. SOLUTION: A susceptor 11 is provided to the bottom of a reaction chamber 10, and a vacuum bellows 12 is placed around th...

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Main Authors IMAI SHINICHI, SEKI KAZUNORI, JIWARI NOBUHIRO
Format Patent
LanguageEnglish
Published 19.07.2001
Edition7
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Abstract PROBLEM TO BE SOLVED: To make a polymer film, sticking to the surface of a member provided near a lower electrode or an inner wall surface of a reaction chamber, hard to peel off. SOLUTION: A susceptor 11 is provided to the bottom of a reaction chamber 10, and a vacuum bellows 12 is placed around the susceptor 11. A holder 13 is provided on the vacuum bellows 12, and further a lower electrode 14 is provided on the susceptor 11. A silicon ring 17 is provided around a semiconductor substrate 16 on the lower electrode 14, and a focus ring 18 is provided outside of the silicon ring 17. The part of the holder 13 not covered with the focus ring 18 and the upper surface, and the upper part of the side surface of the vacuum bellows 12, are covered with a cover member 51 comprising a polyether resin.
AbstractList PROBLEM TO BE SOLVED: To make a polymer film, sticking to the surface of a member provided near a lower electrode or an inner wall surface of a reaction chamber, hard to peel off. SOLUTION: A susceptor 11 is provided to the bottom of a reaction chamber 10, and a vacuum bellows 12 is placed around the susceptor 11. A holder 13 is provided on the vacuum bellows 12, and further a lower electrode 14 is provided on the susceptor 11. A silicon ring 17 is provided around a semiconductor substrate 16 on the lower electrode 14, and a focus ring 18 is provided outside of the silicon ring 17. The part of the holder 13 not covered with the focus ring 18 and the upper surface, and the upper part of the side surface of the vacuum bellows 12, are covered with a cover member 51 comprising a polyether resin.
Author IMAI SHINICHI
SEKI KAZUNORI
JIWARI NOBUHIRO
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Snippet PROBLEM TO BE SOLVED: To make a polymer film, sticking to the surface of a member provided near a lower electrode or an inner wall surface of a reaction...
SourceID epo
SourceType Open Access Repository
SubjectTerms BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Title PLASMA TREATMENT DEVICE
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