PLASMA TREATMENT DEVICE

PROBLEM TO BE SOLVED: To make a polymer film, sticking to the surface of a member provided near a lower electrode or an inner wall surface of a reaction chamber, hard to peel off. SOLUTION: A susceptor 11 is provided to the bottom of a reaction chamber 10, and a vacuum bellows 12 is placed around th...

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Bibliographic Details
Main Authors IMAI SHINICHI, SEKI KAZUNORI, JIWARI NOBUHIRO
Format Patent
LanguageEnglish
Published 19.07.2001
Edition7
Subjects
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Summary:PROBLEM TO BE SOLVED: To make a polymer film, sticking to the surface of a member provided near a lower electrode or an inner wall surface of a reaction chamber, hard to peel off. SOLUTION: A susceptor 11 is provided to the bottom of a reaction chamber 10, and a vacuum bellows 12 is placed around the susceptor 11. A holder 13 is provided on the vacuum bellows 12, and further a lower electrode 14 is provided on the susceptor 11. A silicon ring 17 is provided around a semiconductor substrate 16 on the lower electrode 14, and a focus ring 18 is provided outside of the silicon ring 17. The part of the holder 13 not covered with the focus ring 18 and the upper surface, and the upper part of the side surface of the vacuum bellows 12, are covered with a cover member 51 comprising a polyether resin.
Bibliography:Application Number: JP20000006044