METHOD OF MANUFACTURING CONDUCTIVE THIN FILM PATTERN SUBSTRATE, CONDUCTIVE THIN FILM PATTERN SUBSTRATE AND DISPLAY ELEMENT
PROBLEM TO BE SOLVED: To manufacturing a substrate using a process which does not need bothersome post-treatment, gets on along with environment, costs low, and to form a pattern of SnSbO thin film with ease, which has a high mechanical and chemical strength and is favorable as a transparent conduct...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
19.07.2001
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To manufacturing a substrate using a process which does not need bothersome post-treatment, gets on along with environment, costs low, and to form a pattern of SnSbO thin film with ease, which has a high mechanical and chemical strength and is favorable as a transparent conductive film. SOLUTION: A thin film of InSnO series, SnSbO series, ZnAlO series or Al thin film 2 is formed on a substrate made of insulating glass or so, and a film of a glass paste 3 of low softening point which is phosphoric acid series is formed on the thin film. Constitutional component of the thin film which are contacted with the insulation layer formed of low softening point glass of the phosphoric acid series are melt and become insulation layer region 4, and the conductive thin film region can be patterned as electrodes. |
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Bibliography: | Application Number: JP20000306035 |