MICROSCOPE USING DEEP ULTRAVIOLET LIGHT AS LIGHT SOURCE

PROBLEM TO BE SOLVED: To restrict the damage of a sample caused by deep ultraviolet light with respect to a microscope using the deep ultraviolet light as a light source. SOLUTION: This microscope where observation data are acquired by irradiating an observation object with the deep ultraviolet ligh...

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Bibliographic Details
Main Author OGINO KATSUMI
Format Patent
LanguageEnglish
Published 19.07.2001
Edition7
Subjects
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
TESTING
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Summary:PROBLEM TO BE SOLVED: To restrict the damage of a sample caused by deep ultraviolet light with respect to a microscope using the deep ultraviolet light as a light source. SOLUTION: This microscope where observation data are acquired by irradiating an observation object with the deep ultraviolet light has a control part measuring the line width of a pattern provided at the prescribed position of the observation object and stopping the irradiation of the observation object with the deep ultraviolet light when the line width of the pattern attains a prescribed limiting value. Since the irradiation of the observation object with the deep ultraviolet light is stopped when the line width of the pattern provided at the prescribed position of the observation object attains the limiting value, the observation object is prevented from being damaged equal to or above the limiting value.
Bibliography:Application Number: JP20000000818