PHOTORESIST APPLICATION DEVICE

PROBLEM TO BE SOLVED: To prevent fine particles, which are generated in a cup for rotational application of resist, from sticking onto a wafer due to relifting by suppressing deposition of the fine particles, which comprises steam of solvent containing fine resist mist and resist component generated...

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Bibliographic Details
Main Authors FUJIYAMA HITOSHI, FUKUDA MASAMI, TANNO YASUNORI
Format Patent
LanguageEnglish
Published 29.06.2001
Edition7
Subjects
APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL
APPARATUS SPECIALLY ADAPTED THEREFOR
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL
SEMICONDUCTOR DEVICES
SPRAYING OR ATOMISING IN GENERAL
TRANSPORTING
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Summary:PROBLEM TO BE SOLVED: To prevent fine particles, which are generated in a cup for rotational application of resist, from sticking onto a wafer due to relifting by suppressing deposition of the fine particles, which comprises steam of solvent containing fine resist mist and resist component generated in the cup, at an inner wall of an exhaust area 19. SOLUTION: A current plate 9, that divides a space into two of a waste water area 17 and an exhaust air area 19, is provided in a cup for application consisting of an upper cup 7 and a lower cup 11. Wall surfaces of the lower cup 11 and the current plate 9 demarcating the exhaust air area 19 are wetted with an organic solvent, to form an organic solvent layer 31.
Bibliography:Application Number: JP19990349086