METAL MASK FOR SPUTTERING, AND COLOR FILTER MANUFACTURED BY THE METAL MASK

PROBLEM TO BE SOLVED: To prevent dielectric breakdown to a color pattern caused by abnormal discharge. SOLUTION: In the metal mask 8 having an opening part 8a corresponding to a color pattern 10 formed on a glass substrate 9 and having a clearance part 11 facing the glass substrate inside a circumfe...

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Bibliographic Details
Main Authors SHISHIDO AKIRA, YAMADA ATSUTOSHI
Format Patent
LanguageEnglish
Published 05.06.2001
Edition7
Subjects
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Summary:PROBLEM TO BE SOLVED: To prevent dielectric breakdown to a color pattern caused by abnormal discharge. SOLUTION: In the metal mask 8 having an opening part 8a corresponding to a color pattern 10 formed on a glass substrate 9 and having a clearance part 11 facing the glass substrate inside a circumferential edge 8c of the opening, a conductive part 12 in electric contact with a chrome black light-shading layer 10b formed on an outer circumference of the color pattern is provided on the metal mask side of the clearance part 11.
Bibliography:Application Number: JP19990332568