METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

• Main Author: MATSUMOTO KAZUHARU
• Format: Patent
• Language: English
• Published: 25.05.2001
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device, whereby if an antireflection film is removed by an etch back step, connection holes of adequate shapes can be formed by additionally forming a second antireflection film, to prevent the halation under question especia...