Fe-Ni MATERIAL FOR SHADOW MASK

PROBLEM TO BE SOLVED: To provide an Fe-Ni material for shadow mask, excellent etchability by etching and having clean hole shape in etching. SOLUTION: This material is an iron-nickel alloy material for shadow mask having a composition containing, by weight, 34-38% Ni and <=0.5% Si and also having...

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Bibliographic Details
Main Authors ITO TATSUYA, OMORI TSUTOMU
Format Patent
LanguageEnglish
Published 10.04.2001
Edition7
Subjects
ALLOYS
CHEMISTRY
FERROUS OR NON-FERROUS ALLOYS
METALLURGY
TREATMENT OF ALLOYS OR NON-FERROUS METALS
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Abstract PROBLEM TO BE SOLVED: To provide an Fe-Ni material for shadow mask, excellent etchability by etching and having clean hole shape in etching. SOLUTION: This material is an iron-nickel alloy material for shadow mask having a composition containing, by weight, 34-38% Ni and <=0.5% Si and also having a texture where the X-ray intensity ratio Ir between the cubic orientation (100) in the (111) pole figure and its twin orientation (221) is (0.5 to 5):1. Further, the amount of segregation of Ni component in a sheet-thickness direction, CNis is, <=0.30%, and also the maximum amount of segregation CNimax, is <=1.5%.
AbstractList PROBLEM TO BE SOLVED: To provide an Fe-Ni material for shadow mask, excellent etchability by etching and having clean hole shape in etching. SOLUTION: This material is an iron-nickel alloy material for shadow mask having a composition containing, by weight, 34-38% Ni and <=0.5% Si and also having a texture where the X-ray intensity ratio Ir between the cubic orientation (100) in the (111) pole figure and its twin orientation (221) is (0.5 to 5):1. Further, the amount of segregation of Ni component in a sheet-thickness direction, CNis is, <=0.30%, and also the maximum amount of segregation CNimax, is <=1.5%.
Author OMORI TSUTOMU
ITO TATSUYA
Author_xml – fullname: ITO TATSUYA
– fullname: OMORI TSUTOMU
BookMark eNrjYmDJy89L5WSQc0vV9ctU8HUMcQ3ydPRRcPMPUgj2cHTxDweKBXvzMLCmJeYUp_JCaW4GJTfXEGcP3dSC_PjU4oLE5NS81JJ4rwAjAwNDA0sLYxMzR2OiFAEAxikjcA
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
Edition 7
ExternalDocumentID JP2001098346A
GroupedDBID EVB
ID FETCH-epo_espacenet_JP2001098346A3
IEDL.DBID EVB
IngestDate Fri Jul 19 15:45:28 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_JP2001098346A3
Notes Application Number: JP20000227082
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20010410&DB=EPODOC&CC=JP&NR=2001098346A
ParticipantIDs epo_espacenet_JP2001098346A
PublicationCentury 2000
PublicationDate 20010410
PublicationDateYYYYMMDD 2001-04-10
PublicationDate_xml – month: 04
  year: 2001
  text: 20010410
  day: 10
PublicationDecade 2000
PublicationYear 2001
RelatedCompanies NIPPON YAKIN KOGYO CO LTD
RelatedCompanies_xml – name: NIPPON YAKIN KOGYO CO LTD
Score 2.5353851
Snippet PROBLEM TO BE SOLVED: To provide an Fe-Ni material for shadow mask, excellent etchability by etching and having clean hole shape in etching. SOLUTION: This...
SourceID epo
SourceType Open Access Repository
SubjectTerms ALLOYS
CHEMISTRY
FERROUS OR NON-FERROUS ALLOYS
METALLURGY
TREATMENT OF ALLOYS OR NON-FERROUS METALS
Title Fe-Ni MATERIAL FOR SHADOW MASK
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20010410&DB=EPODOC&locale=&CC=JP&NR=2001098346A
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwY2BQSTIxTbM0SkzWNTNKTdU1AbZZdROTTYx0UxJNUoyTLNNSE8Ex7etn5hFq4hVhGsHEkA3bCwM-J7QcfDgiMEclA_N7Cbi8LkAMYrmA11YW6ydlAoXy7d1CbF3UYL1jYOfC0EDNxcnWNcDfxd9ZzdnZ1itAzS8IImdpYWxi5sjMwApqR4MO2ncNcwJtSylArlPcBBnYAoDG5ZUIMTCl5gkzcDrDrl4TZuDwhc54A5nQzFcswiDnlqrrl6ng6whsgXo6-igA-28KwR6OLv7hQLFgb1EGJTfXEGcPXaBF8XBvxXsFIDnKWIyBBdjfT5VgUDBItTQF1crJpqaJwKrD3NIs2TLNzDAZ2PRKSUsySJZkkMZjkBReWWkGLsgiKhNg-SvDwFJSVJoqC6xVS5LkwKEBAH_Udv4
link.rule.ids 230,309,786,891,25594,76903
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LT8JAEJ4gGvGmqEFRbIzpbWNpt8UeiCktTXn0EanKjbTbbUJMkEiNf99hocqJ22YmmX1lHt_u7CzAQ0r13FQTRgyVc0IxZiUJoyrJEpppqZnzROy0HxjeKx1O9WkFPsq3MKJO6I8ojogaxVDfC2Gvl_-HWI7IrVw9pnMkfT67cdeRS3SM4KKtyE6v249CJ7Rl2-4OIzl42fDMJ40a1gEcdhATCqz01ls_S1nu-hT3FI4iFLcozqDCF3Wo2eXXa3U49rc33tjcKt_qHFouJ8Fc8i2MQAfWWEL8Jk08ywnfkTYZXcC9249tj2BHs79pzYbRzqC0S6gi3ucNkBRu6muvzHQ9QdfRMQ1m5kabYeiV5anCrqC5R9D1Xu4d1LzYH8_Gg2DUhJNNQhVFW3wD1eLrm9-ihy3SlliZXzVSeeg
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Fe-Ni+MATERIAL+FOR+SHADOW+MASK&rft.inventor=ITO+TATSUYA&rft.inventor=OMORI+TSUTOMU&rft.date=2001-04-10&rft.externalDBID=A&rft.externalDocID=JP2001098346A