Fe-Ni MATERIAL FOR SHADOW MASK

PROBLEM TO BE SOLVED: To provide an Fe-Ni material for shadow mask, excellent etchability by etching and having clean hole shape in etching. SOLUTION: This material is an iron-nickel alloy material for shadow mask having a composition containing, by weight, 34-38% Ni and <=0.5% Si and also having...

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Bibliographic Details
Main Authors ITO TATSUYA, OMORI TSUTOMU
Format Patent
LanguageEnglish
Published 10.04.2001
Edition7
Subjects
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Summary:PROBLEM TO BE SOLVED: To provide an Fe-Ni material for shadow mask, excellent etchability by etching and having clean hole shape in etching. SOLUTION: This material is an iron-nickel alloy material for shadow mask having a composition containing, by weight, 34-38% Ni and <=0.5% Si and also having a texture where the X-ray intensity ratio Ir between the cubic orientation (100) in the (111) pole figure and its twin orientation (221) is (0.5 to 5):1. Further, the amount of segregation of Ni component in a sheet-thickness direction, CNis is, <=0.30%, and also the maximum amount of segregation CNimax, is <=1.5%.
Bibliography:Application Number: JP20000227082