ORGANOMETALLIC POLYMER AND USE
PROBLEM TO BE SOLVED: To provide a composition usable as resist, sensitive to image rendering irradiation, and enhanced in its capability to resist reactive ion etching. SOLUTION: A composition which resists reactive ion etching includes polymerizable organometallic monomer acids or ester polymers....
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
21.03.2001
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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