ORGANOMETALLIC POLYMER AND USE

PROBLEM TO BE SOLVED: To provide a composition usable as resist, sensitive to image rendering irradiation, and enhanced in its capability to resist reactive ion etching. SOLUTION: A composition which resists reactive ion etching includes polymerizable organometallic monomer acids or ester polymers....

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Bibliographic Details
Main Authors GUARNIERI C RICHARD, ARI AVIRAMU, KWONG RANEE W, ANGELOPOULOS MARIE
Format Patent
LanguageEnglish
Published 21.03.2001
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:PROBLEM TO BE SOLVED: To provide a composition usable as resist, sensitive to image rendering irradiation, and enhanced in its capability to resist reactive ion etching. SOLUTION: A composition which resists reactive ion etching includes polymerizable organometallic monomer acids or ester polymers. Specifically described, it is a polymer generated to include at least one monomer from the group of organic metal acrylates, organic metal methacrylates, organometallic styrenes, and their mixtures. In this composition, metals are selected from yttrium, aluminum, iron, titanium, zirconium, hafnium, and their mixtures.
Bibliography:Application Number: JP20000209354