LAMINATED SUBSTRATE AND MANUFACTURE THEREOF
PROBLEM TO BE SOLVED: To allow as sharp and smooth carrier concentration profile with no drop in a transition region from an N+ silicon water to an N- silicon wafer. SOLUTION: An N- silicon wafer is laminated on the surface of an N+ silicon wafer. An even and high-resistance N- layer con be manufact...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
23.02.2001
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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