PLASMA GENERATING POWER SUPPLY

• Main Authors: MINE SHINGO, KITAYAMA JIRO
• Format: Patent
• Language: English
• Published: 09.02.2001
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMISTRY; COMPOUNDS THEREOF; CORONA DEVICES; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES; INORGANIC CHEMISTRY; METALLURGY; NON-METALLIC ELEMENTS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SPARK GAPS; SPARKING PLUGS

PROBLEM TO BE SOLVED: To provide a small and inexpensive power supply capable of conducting power factor compensation of a discharge load such that an electrostatic capacity value in a gas region is not negligible, compared to a electrostatic capacity value for a dielectric. SOLUTION: An AC high voltage is supplied from an AC power supply 1 through a rectifier 2, an inverter 31 and a transformer 4 to a discharge load 5 in which a gas region is formed as a discharge space between a pair of opposed electrodes via a dielectric, and a gas in the discharge space is excited to generate plasma. A parallel inductor 61 having an inductance satisfied with Expression 1/ C1×(2πf)2}<=L<=1/ C3×(2πf)2}, where L is the inductance (H), C1 is the electrostatic capacity value (F) for the dielectric, f is the frequency (Hz) of AC voltage applied between both electrodes, C3 is the electrostatic capacity (F) given by (C1×C2)/(C1+C2) and C2 is the electrostatic capacity value in the gas region, is provided on the secondary side of the transformer 4 in parallel to the discharge load 5.