ADHESIVE MASS FOR DEPILATION OF GIVING REDUCED IRRITATION TO SKIN
PROBLEM TO BE SOLVED: To obtain an adhesive mass for depilation which holds sufficient depilation effect and possesses an effect of easing irritation on the skin by formulating an agent for easing irritation to the skin containing glycyrrhetinic acid, a glycyrrhetinic acid derivative and/or a mixtur...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
09.01.2001
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To obtain an adhesive mass for depilation which holds sufficient depilation effect and possesses an effect of easing irritation on the skin by formulating an agent for easing irritation to the skin containing glycyrrhetinic acid, a glycyrrhetinic acid derivative and/or a mixture of glycyrrhetinic acid and stearic acid to an adhesive mass. SOLUTION: This adhesive mass for depilation is obtained by including (A) glycyrrhetinic acid, (B) a glycyrrhetinic acid derivative (e.g. stearyl glycyrrhetinate or the like) and/or (C) a mixture (preferable mixed weight ratio of 1:1 to 1:3) of glycyrrhetinic acid and stearic acid as an agent for easing irritation to the skin in an adhesive mass. It is favorable that the adhesive mass includes (i) an A-B-A type styrene-diene block copolymer and (ii) an adhesion-giving resin, (iii) a liquid rubber and (iv) a compatibilizer in proportions of 100-400 pts.wt., 1-50 pts.wt. and 5-50 pts.wt., respectively, based on 100 pts.wt. of the copolymer as major components. The agent for easing irritation to the skin is preferably formulated in a proportion of 0.005-1.50 pts.wt. based on 100 pts.wt. of the component i. |
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Bibliography: | Application Number: JP19990172263 |