BATCH TRANSFER MASK, PARTIAL BATCH EB EXPOSURE SYSTEM AND BATCH TRANSFER MASK FORMING METHOD

• Main Author: KOJIMA YOSHINORI
• Format: Patent
• Language: English
• Published: 26.12.2000
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To improve throughput in an exposure process by executing exposures without inserting waiting times for each exposure of each cell. SOLUTION: A desired constant aperture coefficient is set for a plurality of cell apertures 10, arranged on a simultaneous transfer mask 9 at generation of a batch transfer mask of a partial batch EB exposure system. A cell aperture 10, having an aperture rate larger than the relevant constant aperture rate, is divided to a plurality of apertures to provide the relevant constant aperture rate and the cell aperture 10 having the aperture rate smaller than the relevant constant aperture rate has arranged, in the desired interval, a plurality of the aperture 8 less than the resolution limit of the EB exposure system used for the exposure. Thereby, the aperture rate of the cell apertures 10 arranged on the batch transfer mask 9 is set to a constant value, by conducting adjustment to provide the relevant constant aperture rate and exposure is performed by setting the focal point compensation amount of the exposure system to a constant value.