PATTERN FORMING METHOD
PROBLEM TO BE SOLVED: To provide a pattern forming method capable of forming a good pattern in the case of forming a resist pattern by imagewise exposing a resist material to a 1-180 nm band light. SOLUTION: This resist material containing at least one atom or a group selected from a halogen atom an...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
24.11.2000
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Abstract | PROBLEM TO BE SOLVED: To provide a pattern forming method capable of forming a good pattern in the case of forming a resist pattern by imagewise exposing a resist material to a 1-180 nm band light. SOLUTION: This resist material containing at least one atom or a group selected from a halogen atom and cyano, mitro, alkoxy, amino, alkyl, trifluoromethyl, and mercapto groups is applied to a semiconductor substrate 10 to form a resist film 11, and irradiated with F2 laser beams having 157 nm band through a mask 12 and developed to form a resist pattern 14. |
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AbstractList | PROBLEM TO BE SOLVED: To provide a pattern forming method capable of forming a good pattern in the case of forming a resist pattern by imagewise exposing a resist material to a 1-180 nm band light. SOLUTION: This resist material containing at least one atom or a group selected from a halogen atom and cyano, mitro, alkoxy, amino, alkyl, trifluoromethyl, and mercapto groups is applied to a semiconductor substrate 10 to form a resist film 11, and irradiated with F2 laser beams having 157 nm band through a mask 12 and developed to form a resist pattern 14. |
Author | KISHIMURA SHINJI KATSUYAMA AKIKO SASAKO MASARU |
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Notes | Application Number: JP20000040647 |
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RelatedCompanies | MATSUSHITA ELECTRIC IND CO LTD |
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Snippet | PROBLEM TO BE SOLVED: To provide a pattern forming method capable of forming a good pattern in the case of forming a resist pattern by imagewise exposing a... |
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SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
Title | PATTERN FORMING METHOD |
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