CVD DEVICE AND PRODUCTION OF MAGNETIC RECORDING MEDIUM

• Main Authors: KOBAYASHI TAKUMI, KOZU JUNICHI
• Format: Patent
• Language: English
• Published: 15.08.2000
• Edition: 7
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INFORMATION STORAGE; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PHYSICS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a thermal filament-plasma CVD device improved so as to obtain a high film forming rate. SOLUTION: In a thermal filament-plasma CVD device in which the state of a gaseous starting material for film formation is made into the one of plasma by discharge between filamentlike cathode and anode heated under a vacuum condition in a film forming chamber, and then, the plasma is acceleratedly bombared against the surface of a substrate by a minus potential to form a film, a funnellike anode 3 is arranged at least either position confronted with the substrate 4 in the film forming chamber 1.