SILICON-CONTAINING RESIST COMPOSITION AND ITS USE
PROBLEM TO BE SOLVED: To obtain the negative tone resist composition comparatively high in silicon content and high in sensitivity and resolution by incorporating a silicon-containing polymer having a phenol group, soluble in an aqueous base, a cross-linking agent, an acid generator and a solvent, a...
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Main Authors | , , , , , |
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Format | Patent |
Language | English |
Published |
11.08.2000
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To obtain the negative tone resist composition comparatively high in silicon content and high in sensitivity and resolution by incorporating a silicon-containing polymer having a phenol group, soluble in an aqueous base, a cross-linking agent, an acid generator and a solvent, and allowing the phenolic polymer containing silicon to have a specific structure. SOLUTION: The composition is a silicon-containing negative resist composition and contains a silicon-containing polymer having a phenol group, soluble in an aqueous base, a cross-linking agent capable of cross-linking the silicon- containing polymer at the sites of the phenolic hydroxyl group, an acid generator and a solvent. The silicon-containing phenolic polymer soluble in an aqueous basic solution has structures represented by the formula in which R1 is an acid-insensitive (inactive) blocking group; Z is an H atom or a -Si(CH3)3; and X is <=1 mol fraction. This silicon-containing polymer has an number average molecular weight of about 800-about 200,000. |
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Bibliography: | Application Number: JP20000023822 |