SILICON-CONTAINING RESIST COMPOSITION AND ITS USE

PROBLEM TO BE SOLVED: To obtain the negative tone resist composition comparatively high in silicon content and high in sensitivity and resolution by incorporating a silicon-containing polymer having a phenol group, soluble in an aqueous base, a cross-linking agent, an acid generator and a solvent, a...

Full description

Saved in:
Bibliographic Details
Main Authors WILLIAM ROSS BRUNSFOLD, DAVID E ZEGER, DOUGLAS CHARLES RA TULIP JR, ARI AFUZAARI ARUDAKAANII, RIN CHIN FAN, KATNANI AHMAD D
Format Patent
LanguageEnglish
Published 11.08.2000
Edition7
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:PROBLEM TO BE SOLVED: To obtain the negative tone resist composition comparatively high in silicon content and high in sensitivity and resolution by incorporating a silicon-containing polymer having a phenol group, soluble in an aqueous base, a cross-linking agent, an acid generator and a solvent, and allowing the phenolic polymer containing silicon to have a specific structure. SOLUTION: The composition is a silicon-containing negative resist composition and contains a silicon-containing polymer having a phenol group, soluble in an aqueous base, a cross-linking agent capable of cross-linking the silicon- containing polymer at the sites of the phenolic hydroxyl group, an acid generator and a solvent. The silicon-containing phenolic polymer soluble in an aqueous basic solution has structures represented by the formula in which R1 is an acid-insensitive (inactive) blocking group; Z is an H atom or a -Si(CH3)3; and X is <=1 mol fraction. This silicon-containing polymer has an number average molecular weight of about 800-about 200,000.
Bibliography:Application Number: JP20000023822