STRATI EPITASSIALI CON QUANTI TA' CONTROLLATE DI AZOTO CRESCIUTI SU SUBSTRATI DI SILICIO
A description is given of a substrate of semiconductor material for manufacture of semiconductor devices, consisting of a first layer of sylicon single crystal on which at least a second layer of silicon single crystal is grown epitaxially, said second layer containing a quantity of nitrogen compris...
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Main Authors | , |
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Format | Patent |
Language | Italian |
Published |
22.02.1990
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Edition | 5 |
Subjects | |
Online Access | Get full text |
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