STRATI EPITASSIALI CON QUANTI TA' CONTROLLATE DI AZOTO CRESCIUTI SU SUBSTRATI DI SILICIO

A description is given of a substrate of semiconductor material for manufacture of semiconductor devices, consisting of a first layer of sylicon single crystal on which at least a second layer of silicon single crystal is grown epitaxially, said second layer containing a quantity of nitrogen compris...

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Bibliographic Details
Main Authors BERETTA GIORGIO, FERLA GIUSEPPE
Format Patent
LanguageItalian
Published 22.02.1990
Edition5
Subjects
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