Charged particle device, charged particle assessment apparatus, measuring method, and monitoring method

• Main Authors: REN Yan, SCOTUZZI Marijke, MANGNUS Albertus Victor Gerardus, SMAKMAN Erwin Paul
• Format: Patent
• Language: English; Hebrew
• Published: 01.08.2024
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY

There is provided a charged particle device for a charged particle inspection apparatus for projecting an array of sub-beams towards a sample, the charged particle device comprising: a charged particle optical element and a detector. The charged particle optical element has an up beam surface having a plurality of openings to generate an array of sub-beams from a charged particle beam. In the charged particle optical element are defined: sub-beam apertures and monitoring apertures. The sub-beam aperture extend through the charged particle element for paths of the array of sub-beams towards a sample, The monitoring aperture extends through the charged particle element. The detector is in the monitoring aperture. At least part of the detector is down-beam of the up beam surface. The detector measures a parameter of a portion of the charged particle beam incident on the detector.