Methods of calibration of a stereolithography system
Provided herein is a system for producing a product. The system generally comprises a large-area micro-stereolithography system, an optical imaging system, and a controller in communication with the large-area micro-stereolithography system and the optical imaging system. The large-area micro-stereo...
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Main Authors | , , , |
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Format | Patent |
Language | English Hebrew |
Published |
01.12.2023
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Subjects | |
Online Access | Get full text |
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Summary: | Provided herein is a system for producing a product. The system generally comprises a large-area micro-stereolithography system, an optical imaging system, and a controller in communication with the large-area micro-stereolithography system and the optical imaging system. The large-area micro-stereolithography system is capable of generating the product by optically polymerizing successive layers of a curable resin at a build plane. The controller is capable of analyzing a focus level of the reference target based on the captured image; and based on the analyzing, adjusting a focus property of the projected image beam of the stereolithography system. |
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Bibliography: | Application Number: IL20230307785 |