Systems and methods for optical metrology
Systems and methods for metrology of workpieces such as wafers, using spectrometry of multi- spot- arrays formed over a test area of the tester workpiece, for optically measuring characteristics of the tested workpiece, where the optical metrology system is configured such that the distribution of e...
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Main Authors | , , , |
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Format | Patent |
Language | English Hebrew |
Published |
01.02.2023
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Subjects | |
Online Access | Get full text |
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Summary: | Systems and methods for metrology of workpieces such as wafers, using spectrometry of multi- spot- arrays formed over a test area of the tester workpiece, for optically measuring characteristics of the tested workpiece, where the optical metrology system is configured such that the distribution of energy density or flux of the multi-spot-array over the test area of the tested workpiece is such that prevents affecting the workpiece during its testing. |
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Bibliography: | Application Number: IL20220299156 |