Integrated metology system
An integrated metrology system for evaluating semiconductor wafers, the metrology system comprises a main body that has a rear side and a front side; the front side defines a front border of the main body; one or more detachable supporting units that are detachably coupled to the main body and suppo...
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Main Authors | , , |
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Format | Patent |
Language | English Hebrew |
Published |
01.09.2022
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Subjects | |
Online Access | Get full text |
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Summary: | An integrated metrology system for evaluating semiconductor wafers, the metrology system comprises a main body that has a rear side and a front side; the front side defines a front border of the main body; one or more detachable supporting units that are detachably coupled to the main body and support the main body while extending outside the front border; and at least one auxiliary supporting unit that is configured to support the main body at an absence of the one or more detachable supporting units |
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Bibliography: | Application Number: IL20220295123 |