METHOD AND APPARATUS FOR SIMULTANEOUS MULTI-PURPOSE EXPLOITATION OF THE BEAM OF CHARGED-PARTICLE CYCLOTRON

The beam exposure spaces are located along the direction of the beam. The proportion of the beam impinging on these spaces is determined by the magnetic field, controlled by the supply to the electromagnet. The target objects of the first exposure space are located on a ring shaped collimator. The t...

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Bibliographic Details
Main Authors GAL,ISTVAN,HU, TARKANYI,FERENC,HU, TAKACS,SANDOR,HU
Format Patent
LanguageEnglish
Published 28.12.1987
Edition4
Subjects
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GAMMA RAY OR X-RAY MICROSCOPES
IRRADIATION DEVICES
NUCLEAR ENGINEERING
NUCLEAR PHYSICS
PHYSICS
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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Summary:The beam exposure spaces are located along the direction of the beam. The proportion of the beam impinging on these spaces is determined by the magnetic field, controlled by the supply to the electromagnet. The target objects of the first exposure space are located on a ring shaped collimator. The target objects of the second exposure space may be located optionally. To allow measurement of the target currents, the target objects are electrically insulated from their surroundings.
Bibliography:Application Number: HU19860001927