PROCESS FOR PRODUCING NEW SATURATED AND PARTLY SATURATED N-ACYL-PYRROL-2,5-DION DERIVATIVES

Compounds of the formulae are disclosed wherein R is hydrogen, halogen, phenyl, phenyl-C1 to C4 alkylthio, C1 to C6 alkylthio, C5 to C7 cycloalkylthio, phenylthio or phenylsulfonyl; R1 is amino, C5 to C7 cycloalkylamino, C1 to C6 alkylamino, C1 to C4-alkoxy-substituted-phenyl-(C1 to C4-alkylamino),...

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Main Authors SERES,JENOE,HU, VARKONYI GEB SCHLOVICSKO,ERIKA,HU, SZILAGYI,ILDIKO,HU, DAROCZI DEB CSUKA,KLARA,HU, HORVATH,GABOR,HU, RADVANYI GEB HEGEDUES,ERZSEBET,HU
Format Patent
LanguageEnglish
Hungarian
Published 28.08.1980
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Summary:Compounds of the formulae are disclosed wherein R is hydrogen, halogen, phenyl, phenyl-C1 to C4 alkylthio, C1 to C6 alkylthio, C5 to C7 cycloalkylthio, phenylthio or phenylsulfonyl; R1 is amino, C5 to C7 cycloalkylamino, C1 to C6 alkylamino, C1 to C4-alkoxy-substituted-phenyl-(C1 to C4-alkylamino), phenylamino, naphthylamino, furfurylamino, phenyl-(C1 to C4)-alkylamino, phenylamino-substituted by C1 to C4 alkoxy, halogen or C1 to C4 alkyl or phenylsulfonyl. R2 is hydrogen; and R3 is C1 to C6 alkyl, alkoxy or phenyl. The compounds have herbicidal properties.
Bibliography:Application Number: HU1977CI01757