DISPERSION CONTAINING HOLLOW SIO2, COATING COMPOSITION, AND SUBSTRATE WITH ANTIREFLECTION COATING FILM

To provide a dispersion of hollow SiO 2 , capable of obtaining, when formed into a coating composition, an antireflection film having high antireflection properties and low chroma saturation by forming a low refractive index coating film having a refractive index gradient. A dispersion of fine silic...

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Bibliographic Details
Main Authors KAWAI, YOHEI, YONEDA, TAKASHIGE
Format Patent
LanguageEnglish
Published 06.02.2009
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Summary:To provide a dispersion of hollow SiO 2 , capable of obtaining, when formed into a coating composition, an antireflection film having high antireflection properties and low chroma saturation by forming a low refractive index coating film having a refractive index gradient. A dispersion of fine silica particles, having agglomerated particles which are agglomerates of primary fine particles of hollow SiO 2 dispersed in a dispersion medium, wherein the average particle size of the agglomerated particles is within a range of from 60 to 400 nm, and the average particle size is at least 1.5 times the average primary particle size of the silica. When a coating composition containing the dispersion is to be obtained, the matrix component is preferably a precursor of a metal oxide or an organic resin. By applying the coating composition to a substrate, a substrate with an antireflection coating film is obtained.
Bibliography:Application Number: HK20080109359