MICRO-BRIDGE STRUCTURE

A method of fabricating a micro-bridge device ( 14, 16 ) onto a substrate ( 20 ). The method includes the steps of: providing a sacrificial material ( 32 ) on a surface region of the substrate ( 20 ); patternwise etching the sacrificial material ( 32 ); providing a sensing material ( 34 ) on a surfa...

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Bibliographic Details
Main Authors REX WATTON, JOHN PETER GILLHAM, JOHN CHARLES ALDERMAN
Format Patent
LanguageEnglish
Published 30.06.2005
Subjects
BASIC ELECTRIC ELEMENTS
COLORIMETRY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT
MEASURING
PHYSICS
RADIATION PYROMETRY
SEMICONDUCTOR DEVICES
TESTING
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Summary:A method of fabricating a micro-bridge device ( 14, 16 ) onto a substrate ( 20 ). The method includes the steps of: providing a sacrificial material ( 32 ) on a surface region of the substrate ( 20 ); patternwise etching the sacrificial material ( 32 ); providing a sensing material ( 34 ) on a surface region of the sacrificial material; providing a support material ( 36 ) on a surface region of the sensing material; and removing the sacrificial material ( 32 ) leaving support material ( 36 ) with the sensing material ( 34 ) on its lower surface, substantially free standing above the substrate ( 20 ).
Bibliography:Application Number: HK20050103609