Improved metal to metal bonding for stacked (3D) integrated circuits

The present invention provides a stabilized fine textured metal microstructure that constitutes a durable activated surface 310 usable for bonding a 3D stacked chip. A fine-grain layer that resists self anneal enables metal to metal bonding at moderate time and temperature and wider process flexibil...

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Main Authors TIEN-JEN J CHENG, MUKTA G FAROOQ, JOHN A FITZSIMMONS
Format Patent
LanguageEnglish
Published 21.10.2015
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Abstract The present invention provides a stabilized fine textured metal microstructure that constitutes a durable activated surface 310 usable for bonding a 3D stacked chip. A fine-grain layer that resists self anneal enables metal to metal bonding at moderate time and temperature and wider process flexibility.
AbstractList The present invention provides a stabilized fine textured metal microstructure that constitutes a durable activated surface 310 usable for bonding a 3D stacked chip. A fine-grain layer that resists self anneal enables metal to metal bonding at moderate time and temperature and wider process flexibility.
Author MUKTA G FAROOQ
TIEN-JEN J CHENG
JOHN A FITZSIMMONS
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Snippet The present invention provides a stabilized fine textured metal microstructure that constitutes a durable activated surface 310 usable for bonding a 3D stacked...
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SubjectTerms BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Title Improved metal to metal bonding for stacked (3D) integrated circuits
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