Layers Having Interference Effect

• Main Authors: WOLF DIETER MUNZ, EHIASAR PAPKEN HOVSEPIAN
• Format: Patent
• Language: English
• Published: 06.10.2004
• Edition: 7
• Subjects: APPARATUS THEREFOR; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTROFORMING; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

A method for forming a base for a decorative layer comprising depositing a first material 801 capable of forming an interference metal oxide onto a second material 802 capable of forming an anodic oxide. The first material may be one of Nb, Ta, or an Al/Ti alloy. The second material may comprise Nb, Ta, Al, Ti or their alloys, and is preferably a layer on a substrate. Ion implantation may be performed on the substrate prior to deposition of the second material.Also claimed is a method of forming a decorative layer comprising forming a base as above and anodising the first material to form an oxide layer 803 that may cause light interference, using a citric acid or ammonium pentaborate electrolyte. The decorative layer may be protected by an additional layer, such as silica. The decorative layer is preferably formed on a polymer substrate.